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Extending 18A With Significant Power And Performance Gains

SemiEngineering·2026/9/2 07:01:16🔗 原文

📌 概要

英特尔通过双接触架构和超低阻接触技术扩展18A工艺,在相同电容下提高驱动电流并支持更高频率,实现功耗与性能的显著提升。

⚡ 关键要点

  • 采用双接触架构提升驱动电流
  • 超低电阻接触技术降低功耗
  • 相同电容下实现更高运行频率

A dual contact architecture with ultra-low-resistance contacts increases drive current and enables higher frequencies at matched capacitance.

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